OLEDON says that it has developed a new curved plane-source evaporation shadow mask process that can be used for OLED microdisplay fabrication, with a potential density of 10,000 PPI (minimum shadow distance of 0.18um). Using this technology it will be possible to create direct-emission microdisplays.

In the video above, you can see the lecture OLEDON's CEO gave last month at iMID 2021, that explains the new technology.

In 2017, OLEDON developed a plane-source evaporation shadow mask process that can achieve a shadow distance of 0.38um - which can enable OLED display resolution to reach 2,250 PPI. In 2018, OLEDON announced that it has developed a vertical-plane source deposition technology that can be used to produce both small-area and large-area OLED panels, aiming to adapt the technology for 12-Gen substrates.

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Cambridge Isotope Laboratories - Deutreated Reagents and High-Purity Gases for OLEDsCambridge Isotope Laboratories - Deutreated Reagents and High-Purity Gases for OLEDs