Toshiba exhibited a new technology that is designed to form patterns called "nano-grating,"
which have a pitch of several hundred nanometers, on a SiO2 substrate,
improving the light extraction efficiency by 1.6 times compared with a case where no measures are taken.
Toshiba created the diffraction grating on a 4-inch SiO2
wafer and used it for a 2mm-square monochrome OLED device. As a result,
the total flux was increased by 60% compared to when no grating is
used. As far as the emission peak wavelength is concerned, the light
emission intensity was virtually doubled, according to the company.
Posted: Feb 23,2009 by Ron Mertens
