Toshiba exhibited a new technology that is designed to form patterns called "nano-grating," which have a pitch of several hundred nanometers, on a SiO2 substrate, improving the light extraction efficiency by 1.6 times compared with a case where no measures are taken.

Toshiba created the diffraction grating on a 4-inch SiO2 wafer and used it for a 2mm-square monochrome OLED device. As a result, the total flux was increased by 60% compared to when no grating is used. As far as the emission peak wavelength is concerned, the light emission intensity was virtually doubled, according to the company. 

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