Dai Nippon Printing Co. Ltd. has developed a new OLED manufacturing method that allows three times higher yields by utilizing a photocatalyst unlike the conventional method of coating with a liquid solvent, and plans to start production in 2007 or 2008.

The prototype OLED uses 2.4-inch high molecular light emission materials. Although it comes in the passive matrix structure, it is possible to apply it to the active matrix type. Dai Nippon Printing is planning to focus on the small size panel market in the initial stage of entry.

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Cambridge Isotope Laboratories - Deutreated Reagents and High-Purity Gases for OLEDsCambridge Isotope Laboratories - Deutreated Reagents and High-Purity Gases for OLEDs